Preparation and growth of SnS thin film deposited by spray pyrolysis technique

Abstract

In this paper thin films of tin sulfide (SnS) were deposited on the glass substrates using spray pyrolysis method with the substrate temperatures in the range of 400–600℃, keeping the other deposition parameters constant. In this work the characteristic of SnS thin films investigated. The XRD pattern and optical transmittance of thin films also are discussed. With the change in concentration of thiourea, the physical properties of the thin films are also investigated.