Optical and Photocatalytic Characteristics of Nitrogen Doped TiO2 Thin Film Deposited by Magnetron Sputtering

Abstract

SiO2 substrates, and then annealed at 400 C. Deposition was performed in a Ar + O2+N2 gas mixture of 1.0 Pa, and oxygen and nitrogen with constant pressures of 0.2 Pa and 0.1 Pa, respectively. The thicknesses of deposited layers, TiO(2????x)Nx/TiO2/ZnO, were approximately 200 nm, 800 nm and 80 nm, respectively. ZnO was used as a bu er layer. The structure and morphology of the deposited lms were evaluated by X-Ray Di raction (XRD) and scanning electron microscopy (SEM). The average grain sizes of TiO2 and nitrogen doped annealed thin lms were 25 and 18 nm, respectively. The microstructure of the annealed lms was anatase. The optical transmittance of the lms was measured using ultravioletvisible light (UV-vis) spectrophotometer. The photocatalytic activity of the samples was evaluated by the degradation of Methylene Blue (MB) dye.