Thermal Oxidation Times Effect on Structural and Morphological Properties of Molybdenum Oxide Thin Films Grown on Quartz Substrates

Abstract

Molybdenum oxide (α-MoO)thin films were prepared on quartz and silicon substrates by thermal oxidation of Mo thin films deposited using DC magnetron sputtering method.<br /> The influence of thermal oxidation times ranging from 60-240 min on the structural and morphological properties<br /> of the preparedfilms was investigated using X-ray diffraction, Atomic force microscopy and Fourier transform infrared<br /> spectroscopy. The XRD results revealed that the as deposited film was amorphous while those formed at thermal<br /> oxidation times between 60-180 min exhibited polycrystalline orthorhombic molybdenum oxides.<br /> The presence of (0k0) reflections in XRD patterns indicated the layered structure of α-MoO. Also the surface morphology<br /> of the films isdependent on the thermal oxidation times. The FTIR spectrum confirmed the formation of MoO3 and the<br /> peak at 992.53 cm-1 implythelayered structure of α-MoO3.